Thin Films characterization at the Hard X-ray Diffraction Beamline, Elettra Synchrotron, Trieste.

 

TITLE

Thin Films characterization at the Hard X-ray Diffraction Beamline, Elettra Synchrotron, Trieste.

STAFF

G. Arrighetti
L. Barba

CNR MODULE

(PM.P06.015) Crystallographic methodologies: developments and e applications
PM.P06.015.003: Development of radiation sources and instrumentations for new generation diffractometry and spectroscopy for structural and functional studies of new materials.

KEYWORDS

nanostructures; X-ray diffraction; thin films; grazing incidence XRD

COLLABORATIONS
CNR-ISMAC, Milano; CNR-IMM, Bologna
DESCRIPTION

The characterization of thin films is an important branch of material science and technology. Thin films are employed in microelectronics, optics, data storage, sensoristics, protection and other purposes. They can be made of metals, inorganic compound, organic compounds and biological molecules. Depending on the desired functionality, the developer has to optimize the deposition conditions to fulfill it in the best way. The success of a deposition can be verified by means of a variety of techniques: from electronic microscopy to ATM, ionic beam scattering, magnetic resonance, optic spectroscopy. Among these, X-ray diffraction is of great importance, and an increasing number or researchers resort to it to elucidate many of the structure-activity connections related to the low or long range ordering of atoms or molecules in the film or at the interface between the film and the substrate. Collaboration with researchers of CNR-ISMAC, Milano and CNR-IMM, Bologna allowed us to prove the four-axis K-diffractometer at the diffraction beamline at Elettra a valuable instrument to perform grazing incidence X-ray diffraction experiments. In the future, an effort is planned to enable also X-ray reflectivity measurements by means of dedicated ancillary equipment, as well as azimuthal scans by means of motorized curved slits.

Thin Films characterization at the Hard X-ray Diffraction Beamline, Elettra Synchrotron, Trieste. - IMAGE

[1]Micro-contact printing of poly(3-hexylthiophene) on silicon oxide: Effect of stamp stretching Scavia, G., Porzio, W., Destri, S., Barba, L., Arrighetti, G.:. European Polymer Journal, In Press, Corrected Proof, Available online 2 June 2010

[2]Highly emissive nanostructured thin films of organic host-guests for energy conversion.Moreau, J., Giovanella, U., Bombenger, J., Porzio, W., Vohra, V., Spadacini, L., et al. (2009). ChemPhysChem, 10(4), 647-653.

[3]Effect of the silanization and annealing on the morphology of thin poly(3-hexylthiophene) (P3HT) layer on silicon oxide. Scavia, G., Porzio, W., Destri, S., Barba, L., Arrighetti, G., Milita, S., et al. (2008). Surface Science, 602(19), 3106-3115.

[4]Influence of substrate temperature and atmosphere on nano-graphene formation and texturing of pulsed Nd:YAG laser-deposited carbon films. Scilletta, C., Servidori, M., Orlando, S., Cappelli, E., Barba, L., Ascarelli, P. (2006) Applied Surface Science
Volume 252, Issue 13, 4877-4881.

 

CONTACTS
Luisa Barba
Email : luisa.barbaATic.cnr.it
Tel. : +39 (0) 403758518/8355